🔗 원문 전체 보기 → Royal Society of Chemistry
요약
Nanoscale, 2026, Advance ArticleDOI: 10.1039/D6NR00357E, Review Article Open Access   This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence.Ze-Wei Chen, Qi Chen, Rithwik Rayani, Soo Ho Choi, Hyunseok KimEmerging …
본문
Emerging strategies for controllable mechanical exfoliation of crystalline thin films and nanomembranes
Ze-Wei Chen,†ab Qi Chen,†ab Rithwik Rayani,
a
Soo Ho
Choiab
and
Hyunseok
Kim
*abcd
Author affiliations
Abstract
Building crystalline heterostructures with arbitrary material combinations, which has been often referred to as “anything-on-anything” integration, has remained a central challenge in materials science and device platforms. Membrane-based technologies provide a viable pathway toward this goal by decoupling thin-film growth from the resulting heterostructures. By isolating high-quality single-crystal layers from their host substrates, lift-off techniques bypass the intrinsic constraints imposed by substrate properties and enable the production of freestanding films and nanomembranes as previously inaccessible material building blocks. Among various lift-off strategies, mechanical lift-off is particularly attractive due to its wide applicability to virtually any material systems. However, the difficulty in manipulating cracks during mechanical lift-off, which determines the properties of exfoliated membranes, has limited the widespread adoption of the technology. Here, we provide key insights into the fundamental mechanics governing mechanical lift-off and discuss how recent breakthroughs in interface design, epitaxy techniques, and crack-guiding principles have enabled highly controlled spalling with atomic precision, scalability, and throughput. We then highlight how such innovations in mechanical lift-off technology, along with other emerging lift-off methods, have advanced membrane-based technologies and have opened new application spaces. Finally, we discuss remaining challenges not only in the lift-off processes themselves but also across the full process flow, outlining pathways toward the broader adoption of lift-off technologies for both fundamental scientific studies and advanced device platforms.
- This article is part of the themed collection: Recent Review Articles
Please wait while we load your content...
Something went wrong. Try again?