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（中央社紐約16日綜合外電報導）根據路透社所見美國國會草案最新版本，一項旨在限制更多晶片製造設備流向中國的法案已被縮減，但持續納入對艾司摩爾（ASML）深紫外光（DUV）浸潤式微影機台的全國性新限制。
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